Electron beam apparatus and electron beam adjusting method
US6586753B2 · kind B2 · utility
9Cited by
23References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 15, 2002 |
| Grant date | Jul 1, 2003 |
| Priority date | — |
| Expiry date | Oct 15, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/282
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam apparatus for irradiating a target with an electron beam includes a reference sample including at least one reference pattern which has a plurality of lattice structures arranged along the circumference of a circle in a evaluation surface of the reference sample; and an adjustment section for adjusting the electron beam by irradiating the evaluation surface with the electron beam on the basis of electrons generated from the reference sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.