Electron beam physical vapor deposition apparatus and crucible therefor

US6589351B1 · kind B1 · utility

Assignee

• General Electric Company · US

Inventors

• Robert William Bruce · Loveland, US
• Antonio F. Maricocchi · Loveland, US
• John D. Evans · Springfield, US
• Rudolfo Viguie · Cincinnati, US
• David V. Rigney · Cincinnati, US
• David J. Wortman · Niskayuna, US
• William Seth Willen · Glastonbury, US

Key dates

• Filing date: Jul 24, 2000
• Grant date: Jul 8, 2003
• Expiry date: Nov 26, 2020

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/564
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion of a crucible that supports the coating material and is configured to be efficiently cooled so as to reduce the rate at which the process temperature increases within the coating chamber.