Method of manufacturing unipolar components
US6590240B1 · kind B1 · utility
21Cited by
6References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 28, 2000 |
| Grant date | Jul 8, 2003 |
| Priority date | — |
| Expiry date | Jul 28, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/0291
Abstract
A method of manufacturing a unipolar component of vertical type in a substrate of a first conductivity type, including the steps of: forming trenches in a silicon layer of the first conductivity type; coating the lateral walls of the trenches with a silicon oxide layer; filling the trenches with polysilicon of the second conductivity type; and annealing to adjust the doping level of the polysilicon, the excess dopants being absorbed by the silicon oxide layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.