Patent · US Expired

Method of and apparatus for manufacturing recording medium

US6592435B2 · kind B2 · utility

12Cited by
6References
14Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJul 13, 2001
Grant dateJul 15, 2003
Priority date
Expiry dateJul 13, 2021

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG11B5/84
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

In a recording medium manufacturing method for obtaining a recording medium by effecting a surface smoothing treatment on a surface smoothing treatment surface of a surface of a medium, the surface smoothing treatment surface of the medium is locally pressed by a polishing work tape having a pressure area less than 1 mm, more preferably, less than 0.5 mm with respect to both radial direction and tangential direction relative to rotation of the medium. In a polishing work of recording medium manufacturing process, a problem of occurrence of defects such as scratches on the surface layer can be improved, whereby yield can be increased and mass-productivity can be improved.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.