Highly pure aqueous hydrogen peroxide solutions, method for producing same and their use
US6592840B1 · kind B1 · utility
10Cited by
15References
23Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 23, 2000 |
| Grant date | Jul 15, 2003 |
| Priority date | — |
| Expiry date | Oct 23, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B15/029
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Disclosed are a highly pure aqueous hydrogen peroxide solution for use in the electronics industry and a process for the preparation of such solutions, which are essentially free from organics, which comprises catalytically converting hydrogen and oxygen, electrochemically reducing oxygen or electrolyzing an acidic ammonium sulfate solution, in each case in water and with the exclusion of organic compounds and materials which release such compounds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.