Patent · US Expired

Highly pure aqueous hydrogen peroxide solutions, method for producing same and their use

US6592840B1 · kind B1 · utility

10Cited by
15References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 23, 2000
Grant dateJul 15, 2003
Priority date
Expiry dateOct 23, 2020

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B15/029
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Disclosed are a highly pure aqueous hydrogen peroxide solution for use in the electronics industry and a process for the preparation of such solutions, which are essentially free from organics, which comprises catalytically converting hydrogen and oxygen, electrochemically reducing oxygen or electrolyzing an acidic ammonium sulfate solution, in each case in water and with the exclusion of organic compounds and materials which release such compounds.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.