Chemically adsorbed film and method of manufacturing the same
US6593000B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 29, 2002 |
| Grant date | Jul 15, 2003 |
| Priority date | — |
| Expiry date | Jan 29, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A highly dense chemically adsorbed film is formed by repeating the alternate process of adsorption reaction and washing. Adsorption reaction is directed by contacting the substrate surface, which has or is given an alkali metal or a functional group, with a chemical adsorbent, having halosilyl or alkoxysilyl groups at the end of molecules. An unreacted chemical adsorbent is then washed away from the substrate surface. The alternate treatment of adsorption reaction and washing is repeated, thereby covalently bonding a chemically adsorbed film to the substrate surface. As a result, a chemically adsorbed film is formed in which stem molecules are directly or indirectly covalently bonded to the substrate surface via at least one element chosen from the group consisting of Si, Ge, Sn, Ti, Zr, S or C and graft molecules are covalently bonded to at least one element chosen from Si, Ge, Sn, Ti, Zr, S or C via at least one bond chosen from —SiO—, —GeO—, SnO—, —TiO—, ZrO—, —SO2—, —SO— and —C—.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.