Transparent, impact-resistant polystyrene on a styrene-butadiene block copolymer basis
US6593430B1 · kind B1 · utility
47Cited by
7References
13Claims
0Family size
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Key dates
| Filing date | Sep 18, 2001 |
| Grant date | Jul 15, 2003 |
| Priority date | — |
| Expiry date | Sep 18, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L53/02
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Block copolymers comprise at least two hard blocks S1 and S2 made from vinylaromatic monomers and, between these, at least one random soft block B/S made from vinylaromatic monomers and from dienes, where the proportion of the hard blocks is above 40% by weight, based on the total block copolymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.