Patent · US Expired

Transparent, impact-resistant polystyrene on a styrene-butadiene block copolymer basis

US6593430B1 · kind B1 · utility

47Cited by
7References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 18, 2001
Grant dateJul 15, 2003
Priority date
Expiry dateSep 18, 2021

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08L53/02
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Block copolymers comprise at least two hard blocks S1 and S2 made from vinylaromatic monomers and, between these, at least one random soft block B/S made from vinylaromatic monomers and from dienes, where the proportion of the hard blocks is above 40% by weight, based on the total block copolymer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.