Patent · US Expired

Opto-coupling device structure and method therefor

US6594422B2 · kind B2 · utility

5Cited by
11References
26Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 2, 2001
Grant dateJul 15, 2003
Priority date—
Expiry dateNov 15, 2021

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B5/18
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A manufacturing technique for making grating features utilizes the etching characteristics for photoresist to provide desirable geometric shapes in close proximity to each other. This results in a grating for optocoupling, which is manufacturable and provides efficient coupling. A silicon waveguide is conveniently achieved using a SOI substrate so that the insulator underlying the silicon provides one material adjoining the silicon with a lower index of refraction than silicon. The top surface of the silicon has the desirable geometric shapes that result also in a lower index of refraction than silicon above the main body of the silicon substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.