Method and apparatus for controlling depth of deposition of a solvent free functional material in a receiver
US6595630B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 12, 2001 |
| Grant date | Jul 22, 2003 |
| Priority date | — |
| Expiry date | Jul 12, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/90
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method and apparatus for delivering a functional material to a receiver includes a pressurized source of solvent in a thermodynamically stable mixture with a functional material. The solvent is in a liquid state within the pressurized source. A discharge device having an inlet and an outlet is connected to the pressurized source at the inlet such that the thermodynamically stable mixture is ejected from the outlet. A receiver having a back is positioned a predetermined distance from the outlet of the discharge device. The solvent of the thermodynamically mixture evaporates at a location beyond the outlet of the discharge device and a predetermined amount of the functional material contacts the receiver at a predetermined distance from the back of the receiver.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.