Organic substrate having optical layers deposited by magnetron sputtering and method for preparing it
US6596368B1 · kind B1 · utility
26Cited by
5References
64Claims
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Key dates
| Filing date | Jan 30, 2001 |
| Grant date | Jul 22, 2003 |
| Priority date | — |
| Expiry date | Jan 30, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31507
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An organic substrate having optically-active layers deposited by magnetron sputtering and a preparation process for it are provided. Gas pressure used for carrying out better adhesion by sputtering is high, comprised between 0.8 and 5.0 Pa. Sputtering is particularly suitable for targets of Si, Ti, Zr and organic substrates with or without anti-abrasive coating. Improved adhesion of thin films is obtained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.