Onset layer for thin film disk with CoPtCrB alloy
US6596409B2 · kind B2 · utility
2Cited by
16References
42Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 9, 2001 |
| Grant date | Jul 22, 2003 |
| Priority date | — |
| Expiry date | Jan 9, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The thin film disk includes a pre-seed layer of amorphous or nanocrystalline structure which may be CrTa or AlTi or AlTa, and that is deposited upon a disk substrate. The pre-seed layer is followed by the RuAl seed layer, a Cr alloy underlayer, an onset layer composed essentially of CoCr and a magnetic layer. The onset layer has an optimal concentration of 28-33 at. % Cr and an optimal thickness of 0.5 to 2.5 nm and it increases coercivity and improves the Signal-to-Noise Ratio (SNR) of the disk.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.