Method for fabricating optical devices with defectless and antireflecting spot size converter
US6596558B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 4, 2002 |
| Grant date | Jul 22, 2003 |
| Priority date | — |
| Expiry date | Mar 4, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/136
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a method for fabricating an optical device integrated with a spot size converter to reduce defect and low reflectivity in a butt-joint portion, the method including the steps of: a) depositing a first clad layer, an active layer and a second clad layer sequentially on the (100) plane of a semiconductor substrate; b) forming on the second clad layer a double dielectric mask of which the lower layer has a relatively wider width than that of the upper layer, exposing one side of the second clad layer; c) wet-etching the first clad layer, the active layer and the second clad layer in a buried ridge structure by using the double dielectric mask, and exposing the (111)A plane of the active layer tilted towards the (100) plane by a predetermined angle; d) growing a spot size conversion region on the (111)A plane of the active layer; and e) removing the double dielectric mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.