Method and apparatus for selectively removing coatings from substrates
US6599416B2 · kind B2 · utility
17Cited by
10References
46Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2001 |
| Grant date | Jul 29, 2003 |
| Priority date | — |
| Expiry date | Jan 19, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25F5/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An electrochemical stripping method for selectively removing at least one coating from the surface of a substrate is described. The substrate is immersed in an aqueous composition through which electrical current flows. The composition includes an acid having the formula HxAF6, in which “A” is Si, Ge, Ti, Zr, Al, or Ga; and x is 1-6. Various coatings can be removed, such as diffusion or overlay coatings. The method can be used to fully-strip a coating (e.g., from a turbine component), or to partially strip one sublayer of the coating. Related processes and an apparatus are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.