Patent · US Expired

Process for producing structured protective and insulating layers

US6599687B1 · kind B1 · utility

0Cited by

5References

6Claims

0Family size

Assignee

OSRAM Opto Semiconductors GmbH · DE

Inventors

Ewald Karl Michael Günther · Regenstauf, DE
Recai Sezi · Simmerath, DE
Michael Keitmann · Weisendorf, DE

Key dates

Filing date	Sep 18, 1998
Grant date	Jul 29, 2003
Priority date	—
Expiry date	Sep 18, 2018

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/143
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A process for producing structured or patterned protective and insulating layers includes applying a solution of a photosensitive polyhydroxyamide or polyhydroxyimide to a substrate and drying. The layer is patterned or structured by irradiation with UV light or X-rays through the use of a mask or by guidance of a UV or electron beam and by subsequent aqueous-alkali development. The patterned or structured layer is irradiated over the whole area with UV light and then tempered or heat-treated.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.