Electron beam apparatus and image forming apparatus
US6600263B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 24, 2000 |
| Grant date | Jul 29, 2003 |
| Priority date | — |
| Expiry date | Dec 3, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2329/866
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention is concerned with an electron beam apparatus comprising: a hermetic container; an electron source disposed within the hermetic container; and a spacer; wherein the spacer includes at least a region where a layer containing fine particles exists, a sheet resistance measured at the surface of the region of the spacer is 107 &OHgr;/□ or more, and the fine particles are 1000 å or less in the average diameter of the particles and includes at least metal elements. The electron beam apparatus exhibits the excellent display quality which suppresses the displacement of the light emission point with the charge and the creeping discharge, and the long-period reliability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.