Patent · US Expired

Automated polishing apparatus and method of polishing

US6602110B2 · kind B2 · utility

17Cited by
7References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 28, 2001
Grant dateAug 5, 2003
Priority date
Expiry dateJun 28, 2021

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24B49/16
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A polishing system for polishing a surface of a substrate, such as the surface of an optical pin mold, to a desired surface finish and profile under the automated control of a computer during a polishing cycle. The polishing system includes a polishing spindle assembly that holds and rotates a polishing tool that is contacted under pressure with a surface of the mold pin. A torque sensor is associated with the polishing spindle assembly to sense a torque on the polishing tool during the polishing cycle. The polishing system further includes a feedback control system that dynamically adjusts the position of the polishing spindle assembly in response to the torque sensed by the torque sensor to maintain a substantially constant torque on the polishing tool during the polishing cycle.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.