Patent · US Expired

Low-pressure gas discharge lamp with a copper-containing gas filling

US6603267B2 · kind B2 · utility

4Cited by

3References

6Claims

0Family size

Assignee

KONINKLIJKE PHILIPS ELECTRONICS NV · NL

Inventors

Rainer Hilbig · Aachen, DE
Robert Scholl · Roetgen, DE
Achim Koerber · Kerkrade, NL
Johannes Baier · Harsewinkel, DE

Key dates

Filing date	Sep 7, 2001
Grant date	Aug 5, 2003
Priority date	—
Expiry date	Sep 8, 2021

Classification

Technology area (CPC H)Electricity
CPC primaryH01J61/70
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A low-pressure gas discharge lamp having a gas discharge vessel containing a gas filling including a copper compound. The copper compound is selected from the oxides, chalcogenides, hydroxides, hydrides and the metalorganic compounds of copper. In addition to the copper compound, the gas filling includes a buffer gas such as argon, and may also include a thallium compound and/or a copper halogenide.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.