Imageable photoresist laminate
US6605406B2 · kind B2 · utility
2Cited by
8References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2001 |
| Grant date | Aug 12, 2003 |
| Priority date | — |
| Expiry date | Apr 27, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/012
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive laminate structure including a carrier layer and a photosensitive layer is described. The photosensitive layer includes a polymeric photosensitive resin composition containing at least one cross-linkable unit represented by the formula: wherein X is an organic moity and Y is selected from the following group: wherein Z is selected from at least one of lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, and tetraalkylammonium.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.