Patent · US Expired

Method for producing fused silica and doped fused silica glass

US6606883B2 · kind B2 · utility

19Cited by
8References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 27, 2001
Grant dateAug 19, 2003
Priority date
Expiry dateJun 3, 2021

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC03B2207/32
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

A method for forming a fused silica glass includes delivering a silica precursor to a burner and passing the silica precursor through the flame of the burner to form silica particles, depositing the silica particles on a planar surface to form a flat, porous preform, dehydrating the porous preform, and consolidating the porous preform into a flat, dense glass.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.