Patent · US Expired

Semiconductor device equipped with semiconductor circuits composed of semiconductor elements and process for production thereof

US6608357B1 · kind B1 · utility

18Cited by
21References
30Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 21, 2000
Grant dateAug 19, 2003
Priority date
Expiry dateAug 24, 2020

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D86/60

Abstract

A semiconductor device and a process for production thereof, said semiconductor device having a new electrode structure which has a low resistivity and withstands heat treatment at 400° C. and above. Heat treatment at a high temperature (400-700° C.) is possible because the wiring is made of Ta film or Ta-based film having high heat resistance. This heat treatment permits the gettering of metal element in crystalline silicon film. Since this heat treatment is lower than the temperature which the gate wiring (0.1-5 &mgr;m wide) withstands and the gate wiring is protected with a protective film, the gate wiring retains its low resistance.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.