Silicon on insulator optical membrane structure for fabry-perot MOEMS filter
US6608711B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 11, 2000 |
| Grant date | Aug 19, 2003 |
| Priority date | — |
| Expiry date | Dec 11, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/02
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for fabricating an optical membrane device comprises providing a handle wafer and then oxidizing a surface of the handle wafer to form an insulating layer. A device wafer is then bonded to the handle wafer. An optical membrane structure is formed in this device wafer. The insulating layer is selectively removed to release the membrane structure. This device wafer can be manufactured from silicon wafer material. Such material typically has a low number of dislocations yielding a stable mechanical membrane structure. The insulating layer defines the electrical cavity across which electrical fields are established that are used to electrostatically deflect the membrane structure. The insulating layer is between 3 and 6 micrometers (&mgr;m) in thickness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.