Patent · US Expired

Multilayer integrated optical device and a method of fabrication thereof

US6608947B2 · kind B2 · utility

7Cited by
13References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 22, 2002
Grant dateAug 19, 2003
Priority date
Expiry dateJul 22, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B6/132
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method of fabricating an integrated optical device and such a device, comprising a structure including at least one waveguiding element are presented. A basic structure is formed containing a substrate material carrying a buffer material layer coated with a core material layer of a higher refraction index as compared to that of the buffer layer. The at least one waveguiding element is defined in a guiding layer on top of the basic structure. The guiding layer is made of a material with a refractive index higher than the refractive index of the buffer layer and the core layer, and is chosen so as to minimize a height of the at least one waveguiding element and to provide effective guiding of light in the core layer. A cladding layer is formed on top of the so-obtained structure, wherein a height difference between the cladding layer region above the waveguiding element and the cladding layer region outside the waveguiding element is substantially small resulting in a desired flatness of the top cladding layer to allow direct formation of a further waveguide structure thereon and prevent significant perturbations in light propagation within the further waveguide structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.