Organic polymers for bottom antireflective coating, process for preparing the same, and compositions containing the same
US6610457B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Oct 15, 2001 |
| Grant date | Aug 26, 2003 |
| Priority date | — |
| Expiry date | Oct 31, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/302
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A bottom antireflective coating layer is made from the compositions of organic photosensitive materials that contain isoflavone chromophore by photolithography utilizing a deep ultraviolet light source for producing a submicro-level, large-scale integrated chip. A copolymer containing an isoflavone chromophore is used as a bottom antireflective coating layer for fabricating a 64-megabit or gigabit DRAM. The antireflective coating layer enables not only the suppression of reflections of light that occur under the substrate layer but also the removal of standing waves. Consequently, a high-resolution sub-micron of a 100˜200 nm integrated circuit is able to be stably formed. Therefore, it is possible to increase the production of semiconductors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.