Process for patterning a membrane
US6610464B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 24, 2001 |
| Grant date | Aug 26, 2003 |
| Priority date | — |
| Expiry date | May 24, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for patterning a non-rigid membrane in a closed gap environment including the optional step of applying a solvent to the non-rigid membrane, applying a layer of an energy-sensitive composition to the non-rigid membrane, spinning the non-rigid membrane, inverting the non-rigid membrane with the layer of an energy-sensitive composition, spinning the inverted non-rigid membrane, re-inverting the non-rigid membrane, and spinning the re-inverted, non-rigid membrane. As a result of the inverting step and the inverted spinning step, the layer of an energy-sensitive composition does not cause the non-rigid membrane to sag and the resulting layer of energy-sensitive composition is substantially uniform in thickness. The energy-sensitive composition may be a photoresist, such as a chemically amplified photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.