Patent · US Expired

Imageable element having a protective overlayer

US6613494B2 · kind B2 · utility

6Cited by

3References

28Claims

0Family size

Assignee

Kodak Polychrome Graphics Company Ltd. · US

Inventors

Celin Savariar-Hauck · Badenhausen, DE
Gerhard Hauck · Badenhausen, DE
Dietmar Frank · Northeim, DE
Ulrich Fiebag · Würzburg, DE

Key dates

Filing date	Mar 13, 2001
Grant date	Sep 2, 2003
Priority date	—
Expiry date	Jul 23, 2021

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB41C2210/262
WIPO fieldTextile and paper machines
WIPO sectorMechanical engineering

Abstract

Positive-working imageable elements and methods for their preparation are disclosed. The elements comprise a hydrophilic substrate; a bottom layer, which contains a positive-working photosensitive composition; and a protective overlayer, which has an overlayer material that reduces the solubility of the photosensitive composition in an aqueous alkaline developer. The overlayer may be conveniently applied by a dip and rinse procedure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.