Method for preparing optical waveguide substrate
US6615614B1 · kind B1 · utility
43Cited by
2References
14Claims
0Family size
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Key dates
| Filing date | Jul 6, 2000 |
| Grant date | Sep 9, 2003 |
| Priority date | — |
| Expiry date | Nov 27, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12061
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical waveguide substrate is prepared by forming grooves in a silicon substrate in accordance with the pattern of a desired waveguide device, thermally oxidizing the silicon substrate to form a peripheral quartz layer surrounding the grooves, burying in the grooves a doped quartz glass layer having a higher refractive index, abrading the surface of the resulting structure to be flat, and forming on the flat surface a glass layer having a lower refractive index. An optical waveguide substrate featuring no distortion of the core pattern, little warp, and a low loss can be produced in a simple manner.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.