Method and apparatus for measuring wavefront aberrations
US6616279B1 · kind B1 · utility
92Cited by
3References
13Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 2, 2000 |
| Grant date | Sep 9, 2003 |
| Priority date | — |
| Expiry date | Oct 2, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J1/0414
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus and method for measuring wavefront aberrations. The apparatus comprises a reflecting device for reflecting selected portions of the wavefront, an imaging device for capturing information related to the selected portions, and a processor for calculating aberrations of the wavefront from the captured information. The method comprises reflecting selected portions of a wavefront onto the imaging device, capturing information related to the selected portions, and processing the captured information to derive the aberrations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.