Method for reducing leaching in metal-coated MEMS
US6616853B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2001 |
| Grant date | Sep 9, 2003 |
| Priority date | — |
| Expiry date | Apr 30, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/3518
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method is provided for preventing dopant leaching from a doped structural film during fabrication of a microelectromechanical system. A microstructure that includes the doped structural film, sacrificial material, and metallic material is produced with a combination of deposition, patterning, and etching techniques. The sacrificial material is dissolved with a release solution that has a substance destructive to the sacrificial material. This substance also acts as an electrolyte, forming a galvanic cell with the doped structural film and metallic material acting as electrodes. The effects of the galvanic cell are suppressed by including a nonionic detergent mixed in the release solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.