Low stress relaxation elastomeric materials
US6617016B2 · kind B2 · utility
192Cited by
24References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2002 |
| Grant date | Sep 9, 2003 |
| Priority date | — |
| Expiry date | Apr 7, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T442/651
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A low stress relaxation elastomeric material comprises a block copolymer having an elasotmeric soft block portion and thermoplastic hard block portions, at least one vinylarene resin and mineral oil. The elasotmeric material may be used in a film comprising an elastomeric layer and at least one substantially less elastomeric skin layer. The skin layer comprises a thermoplastic polymer such as polyolefins. The film exhibits desired elastic and stress relaxation properties at body temperature. The film is useful in forming a macroscopically-expanded, three-dimensional elastomeric web.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.