Barrier layer for silicon containing substrate
US6617036B2 · kind B2 · utility
15Cited by
4References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 19, 2001 |
| Grant date | Sep 9, 2003 |
| Priority date | — |
| Expiry date | Dec 19, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a barium-strontium aluminosilicate includes an aluminosilicate of Group IIA and/or Group IIIB and a Group VB oxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.