Bath system for galvanic deposition of metals
US6620304B1 · kind B1 · utility
8Cited by
3References
21Claims
0Family size
Inventor
Key dates
| Filing date | Dec 4, 2001 |
| Grant date | Sep 16, 2003 |
| Priority date | — |
| Expiry date | Dec 4, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D3/46
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A bath system for galvanic deposition of metals includes a solution containing at least one metal, especially a precious metal and/or precious metal alloy in the form of a water-soluble salt, at least one water-soluble protein material or amino acid and/or at least one water-soluble sulfonic acid, at least one water-soluble nitro-containing substance, at least one water-soluble surface-active agent and at least one vitamin. The bath system galvanostatically applies high quality layers with uniform quality. The bath system can be kept free of harmful substances such as cyanides, sulfites and hard complexing agents.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.