Method for manufacturing a thin-layer component, in particular a thin-layer high-pressure sensor
US6620644B2 · kind B2 · utility
2Cited by
2References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 23, 2001 |
| Grant date | Sep 16, 2003 |
| Priority date | — |
| Expiry date | Oct 12, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K26/066
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A manufacturing method for a thin-layer component, in particular a thin-layer high-pressure sensor, having a substrate on which the at least one functional layer to be patterned is to be deposited in the steps, preparing the substrate; depositing the functional layer on the substrate; and patterning the functional layer via a laser processing step, the laser processing step being selective with respect to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.