Microelectronic system with integral cryocooler, and its fabrication and use
US6621071B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 7, 2001 |
| Grant date | Sep 16, 2003 |
| Priority date | — |
| Expiry date | Sep 7, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/3011
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
A microelectronic system includes a substrate that is preferably silicon and a microelectronic device supported on the substrate. The microelectronic device may be a light sensor that include a readout integrated circuit formed in the silicon substrate, and a light detector supported on and electrically interconnected with the readout integrated circuit. A cryocooler formed in and integral with the substrate includes a gas inflow channel formed in the substrate, an expansion nozzle formed in the substrate and receiving a gas flow from the gas inflow channel, and a gas outflow channel that receives the gas flow from the outlet of the expansion nozzle. The gas inflow channel and the gas outflow channel may be countercurrent spirals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.