Device isolation process flow for ARS system
US6621096B2 · kind B2 · utility
13Cited by
9References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 21, 2001 |
| Grant date | Sep 16, 2003 |
| Priority date | — |
| Expiry date | Jun 5, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/723
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A device isolation process flow for an atomic resolution storage (ARS) system inserts device isolation into a process flow of the ARS system so that diodes may be electrically insulated from one another to improve signal to noise ratio. In addition, since most harsh processing is done prior to depositing a phase change layer, which stores data bits, process damage to the phase change layer may be minimized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.