Plasma controlled antenna
US6621459B2 · kind B2 · utility
18Cited by
9References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 30, 2002 |
| Grant date | Sep 16, 2003 |
| Priority date | — |
| Expiry date | Jan 30, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01Q19/104
- WIPO fieldTelecommunications
- WIPO sectorElectrical engineering
Abstract
An improved plasma controlled millimeter wave (MMW) or microwave (&mgr;W) antenna is provided. A plasma of electrons and holes is photo-injected into a photoconducting wafer. A special distribution of plasma and a MMW/&mgr;W reflecting surface behind the wafer allows the antenna to be generated at low light intensities and a 180° phase shift (modulo 360°) to be applied to selected MMWs/&mgr;Ws.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.