Method for diagnosing process parameter variations from measurements in analog circuits
US6625785B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 19, 2001 |
| Grant date | Sep 23, 2003 |
| Priority date | — |
| Expiry date | Jun 30, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/08
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for diagnosing process parameter variations from measurements in analog circuits. The diagnosability conditions for the accurate computation of device parameters are extended in the presence of measurement noise. In case this diagnosability condition is not met by standard test signals, a method is provided for automatically generating optimized tests that enable the computation of device parameters. The test generator explicitly optimizes the ability to compute device parameters from the test response. A cause-effect analysis engine is provided to diagnose the cause of variation in IC performance metrics in terms of the variation in device parameter values. Once the cause of parametric yield loss is diagnosed in terms of device parameters variations, the information can be used by process engineers to tune the manufacturing process to improve yield.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.