Apparatus and method for drying a thin substrate
US6625901B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 20, 2000 |
| Grant date | Sep 30, 2003 |
| Priority date | — |
| Expiry date | Jan 18, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A dryer for drying a substrate includes: a bath containing a fluid; a chamber; and an isopropyl alcohol delivery system supplying isopropyl alcohol vapor to the interface between the substrate and the fluid when the substrate is removed from the fluid of the bath into the chamber. The isopropyl alcohol vapor is supplied perpendicularly to a vertical axis of the substrate. The dryer further includes a chamber environment control system that supplies a gas into the chamber to dry the substrate and controls temperature and humidity in the chamber and a chamber heater attached to the chamber to transfer thermal energy into the chamber. A drying method includes: immersing a substrate into a fluid contained in a bath; removing the substrate from the fluid into a chamber; and supplying isopropyl alcohol vapor into an interface between the substrate and the fluid perpendicularly to a vertical axis of the substrate. The method further includes: supplying a gas into the chamber to dry the substrate and to control temperature and humidity in the chamber; and heating the chamber to transfer thermal energy into the chamber and the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.