Method of manufacturing electron-emitting device as well as electron source and image-forming apparatus
US6626719B2 · kind B2 · utility
42Cited by
3References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 10, 1997 |
| Grant date | Sep 30, 2003 |
| Priority date | — |
| Expiry date | Jan 10, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/027
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron-emitting device comprises a pair of oppositely disposed electrodes and an electroconductive film inclusive of an electron-emitting region arranged between the electrodes. The electric resistance of the electroconductive film is reduced after forming the electron-emitting region in the course of manufacturing the electron-emitting device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.