Method for phosphor coating on flat display using electrophoretic deposition and photolithography
US6627060B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 25, 2000 |
| Grant date | Sep 30, 2003 |
| Priority date | — |
| Expiry date | Apr 7, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for coating a phosphor on a flat display using electrophoretic deposition (EPD) and lithography is provided. In the method, an adhesive strength can be enhanced without passing through a high-temperature thermal treatment process as a post-process. Phosphor powders are coated on a substrate by a field emission display (FED) and then a ultraviolet (UV) curable layer is coated. Then, an adhesive strength of the phosphor can be greatly enhanced through UV irradiation, in comparison with a post-process such as a thermal treatment process. Also, the UV curable layer can be lithographically etched by the UV light, and thus the phosphor can be coated by a predetermined pattern, to then be applied to a next-generation display such as a FED or PDP as an optimal method for full color realization.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.