Method for producing composition for vapor deposition, composition for vapor deposition, and method for producing optical element with antireflection film
US6627320B2 · kind B2 · utility
1Cited by
6References
19Claims
0Family size
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Key dates
| Filing date | Nov 29, 2001 |
| Grant date | Sep 30, 2003 |
| Priority date | — |
| Expiry date | Jan 3, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/152
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for producing a composition for vapor deposition comprising sintering a vapor source mixture prepared by mixing vapor sources that contain titanium dioxide and niobium pentoxide. The method is capable of forming a high-refraction layer even in low-temperature vapor deposition on a substrate. An antireflection film is formed having good scratch resistance, good chemical resistance and good heat resistance, of which the heat resistance decreases little with time, that is useful in a variety of optical elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.