Cleaning compositions
US6627587B2 · kind B2 · utility
42Cited by
11References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 19, 2001 |
| Grant date | Sep 30, 2003 |
| Priority date | — |
| Expiry date | Jun 24, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02071
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An aqueous cleaning composition comprising an alkanolamine, a tetraalkylammonium hydroxide, nonmetallic fluoride salt, a corrosion inhibitor, e.g. ascorbic acid or its derivatives alone or in combination, balance water. Such cleaning compositions are effective to remove residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper and attack of dielectric substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.