Optical barrier and methods for forming the optical barrier without etching a transparent layer below the optical barrier

US6627866B2 · kind B2 · utility

Assignee

• AGILENT TECHNOLOGIES, INC. · US

Inventors

• David W Hula · Fort Collins, US
• Robert G. Long · Toronto, CA

Key dates

• Filing date: Oct 5, 2001
• Grant date: Sep 30, 2003
• Expiry date: Oct 5, 2021

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L2924/0002

Abstract

An optical barrier made of tungsten (W) or titanium-tungsten (TiW). A layer of the optical barrier material is deposited over a transparent layer such as indium tin oxide (ITO). The optical barrier material is then patterned using photolithography processing steps and a dry etchant. The patterned optical barrier material acts as a light-shielding layer over a light-sensing device to form a dark reference device or dark pixel.