Method for forming graphical images in semiconductor devices
US6629292B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 6, 2000 |
| Grant date | Sep 30, 2003 |
| Priority date | — |
| Expiry date | Aug 1, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
High resolution gray scale graphical images are formed in a semiconductor substrate by the use of two or more levels of indicia having a plurality of image segments and having a continuous conductive line formed in the surface of the substrate, each image segment includes a portion of said continuous conductive line and a contrasting material providing pixels in which the width of the line within a segment varies in relationship to gray scale levels in the graphic image to be formed. Providing a graphic image to be converted; converting the graphic image to a gray level, two dimensional bit mapped converting the bit mapped image into a set of parallel lines of varying width; each line comprising a single continuous segment in which the width varies based on the density of the gray level required to form the gray level image; and transferring the set of lines to a pattern of conductor/insulator lines on a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.