Low reflection composite in transparent matrix
US6630284B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 30, 2001 |
| Grant date | Oct 7, 2003 |
| Priority date | — |
| Expiry date | Oct 30, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31855
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A thin film composite material is disclosed which includes an antireflection layer (6) interposed between a metal layer (2) and a transparent layer (1). The antireflection layer (6) reduces reflection of light by the metal layer (2) when light reaches the metal layer (2) after passing through the transparent layer (1) and the antireflection layer (6). The antireflection layer (6) has an index of refraction greater than 2.5 and an extinction coefficient which is less than 0.5 at 600-1200 nm wavelengths. Suitable materials for the antireflection layer (6) include oxides of copper (especially cuprous oxide), Iran II oxide and SiC. The antireflection layer (6) is advantageously applied so that it has an optical thickness of one quarter wavelength with respect to the wavelength of the light which is to be antireflected. The metal layer (2) is made from a gray low reflectance type metal such as Ti, Zr, Hf, Cr, Mo, W, Ni, Pd, or Pt or alloys of these metals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.