Ion gun deposition and alignment for liquid-crystal applications
US6632483B1 · kind B1 · utility
57Cited by
16References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 30, 2000 |
| Grant date | Oct 14, 2003 |
| Priority date | — |
| Expiry date | Jul 14, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention includes a method of forming an aligned film on a substrate. The film is deposited and aligned in a single step by a method comprising the step of bombarding a substrate with an ion beam at a designated incident angle to simultaneously (a) deposit the film onto the substrate and (b) arrange an atomic structure of the film in at least one predetermined aligned direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.