Apparatus and method for coating substrates with vacuum depositable materials
US6638569B2 · kind B2 · utility
22Cited by
8References
13Claims
0Family size
Inventors
Key dates
| Filing date | Jun 25, 2001 |
| Grant date | Oct 28, 2003 |
| Priority date | — |
| Expiry date | Jun 25, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/509
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for coating a substrate with a diamond like coating or other vacuum depositable material comprises a chamber 11 having, or acting as, an anode, means for supporting a substrate 15 in the chamber, means for establishing a low pressure atmosphere containing a hydrocarbon-based gas in the chamber, and a radio frequency source 12 for establishing a gas plasma in the chamber, the substrate 15 acting as a cathode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.