Phase-shifting mask and semiconductor device
US6638663B1 · kind B1 · utility
2Cited by
7References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 20, 2000 |
| Grant date | Oct 28, 2003 |
| Priority date | — |
| Expiry date | Jan 20, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/28
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a phase-shifting mask having a pattern comprising a plurality of substantially transparent regions and a plurality of substantially opaque regions wherein the mask pattern phase-shifts at least a portion of incident radiation and wherein the phases are substantially equally spaced, thereby increasing resolution of a given lithographic system. Further disclosed is a semiconductor device fabricated utilizing the phase-shifting mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.