Method for making monolithic patterned dichroic filter detector arrays for spectroscopic imaging
US6638668B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 14, 2001 |
| Grant date | Oct 28, 2003 |
| Priority date | — |
| Expiry date | Feb 23, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F77/331
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A monolithic patterned dichroic filter array is mounted on a wafer by combining microelectronic and microlithography techniques. A wafer is coated with a photoresist. The assembly is masked, and the unmasked photoresist, after exposure to ultraviolet light, is developed to expose a predetermined section. That section of wafer is then over developed to create an undercut in its walls and to expose the underlying wafer. Dichroic filter material is then deposited onto the wafer by a cold process, and the photoresist layer is then removed, leaving only the dichroic filter material on the wafer. The process is repeated to create an array. The finished wafer is then bonded to a linear or two dimensional detector array, or to a glass window that is then bonded to a linear or two dimensional detector, to create a high performance spectral detector for spectroscopic imaging. When placed on a two dimensional detector in a camera, an imaging system capable of showing spatial variation in color, chemicals or other spectrally dependent parameters is produced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.