Six-axis positioning system having a zero-magnetic-field space

US6639225B2 · kind B2 · utility

Assignee

• Leica Microsystems Lithography · DE

Inventors

• Ulf-Carsten Kirschstein · Jena, DE
• Erik Beckert · Arnstadt, DE
• Andrew Kenneth Hoffmann · Burnaby, CA
• Christoph Schaeffel · Ilmenau, DE
• Eugen Saffert · Waldgirmes, DE
• Johannes Zentner · Ilmenau, DE
• Torsten Gramsch · Langewiesen, DE

Key dates

• Filing date: Sep 14, 2001
• Grant date: Oct 28, 2003
• Expiry date: Apr 10, 2022

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/202
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention refers to an arrangement for positioning substrates, in particular for positioning wafers, within a device that is provided for exposure of the substrates and/or for measurement on the substrates by means of radiation under high-vacuum conditions. The following are provided according to the present invention: a retention system (4), displaceable on a linear guidance system (3), for receiving the substrate, the guidance direction of the linear guidance system (3) being oriented parallel or substantially parallel to the Y coordinate of an X, Y, Z spatial coordinate system; drives for limited modification of the inclination of the guidance direction relative to the Y coordinate; drives for limited rotation of the linear guidance system (3), including the retention system (4), about the guidance direction; and drives for parallel displacement of the linear guidance system (3), including the retention system (4), in the direction of the X coordinate, the Y coordinate, and/or the Z coordinate.