Position measuring method and position measuring system using the same
US6639677B1 · kind B1 · utility
11Cited by
4References
11Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 20, 2000 |
| Grant date | Oct 28, 2003 |
| Priority date | — |
| Expiry date | Mar 1, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7046
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A position measuring method and a position measuring system using the same are disclosed. Plural marks of different linewidths are formed at different locations on an object to be measured, and the plural marks are detected, at the different locations and with different focus states. For determination of a measurement mark, such a mark among the plural marks as having a linewidth with which a change in focus characteristic, at the different locations, is smallest, is selected, and then the position measurement is performed to the object by using the determined measurement mark.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.